• Semiconductor Implant Equipment Engineer

    Renesas (Palm Bay, FL)
    …looking for a skilled professional to fill the role of Equipment Engineer supporting Ion Implant in its manufacturing facility in Palm Bay, Florida. The ... . 5 or more years of Semiconductor experience in Equipment Engineering, Ion Implant expertise required. **Additional Experience (Required):** + Experience… more
    Renesas (07/18/25)
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  • Process Integration Engineer (Power Devices)

    Insight Global (Essex Junction, VT)
    …technologies. This role will focus on process development within the Furnace or Ion Implant areas, contributing to device fabrication and technology ramp-up at ... qualification of high-voltage power devices. Oversee process integration within Furnace and Ion Implant areas, ensuring stability and yield improvements. Work… more
    Insight Global (09/09/25)
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  • Technician/Engineer I

    Rochester Institute of Technology (Rochester, NY)
    …track, direct-write laser), thermal (dopant diffusion and oxide growth furnaces, ion implant , rapid-thermal-processing [RTP]), etch (reactive ion ... etch, inductively coupled plasma systems, oxygen plasma ash), deposition (plasma-enhanced chemical vapor deposition [PECVD], low-pressure chemical vapor deposition [LPCVD], atomic layer deposition [ALD], DC and RF sputter, thermal/e-beam evaporation,… more
    Rochester Institute of Technology (08/08/25)
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  • Process Support Engineer IV

    Applied Materials (Austin, TX)
    …technologies such as: Chemical Vapor Deposition, Atomic Layer Deposition, Plasma Reactive Ion Etch, Physical Vapor Deposition, Anneal and Implant . **Role ... Responsibilities:** + Draw from your specialized expertise to provide high-visibility customer support through on-site installations, system diagnoses, and the service and repair of complex systems and equipment + Work closely with the customer to develop… more
    Applied Materials (08/27/25)
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  • U109 Solid State Technician - 4th Shift

    Northrop Grumman (Linthicum Heights, MD)
    …+ Dry Etch: Removing material deposited onto wafers by using reactive ion etching (RIE) for anisotropic removal or through inductively coupled plasma (ICP) ... etch for isotropic removal of material. + Implant : Changing physical, chemical, or electrical properties of a substrate by accelerating and bombarding ions of a… more
    Northrop Grumman (08/21/25)
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