• U109 Solid State Technician - 4th Shift

    Northrop Grumman (Linthicum Heights, MD)
    …using reactive ion etching (RIE) for anisotropic removal or through inductively coupled plasma (ICP) etch for isotropic removal of material. + Implant: Changing ... a photosensitive material spun onto the wafer surface. + Clean / Wet Etch : Cleaning substrates before a sensitive downstream process step or stripping undesirable… more
    Northrop Grumman (08/21/25)
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