- Northrop Grumman (Linthicum Heights, MD)
- …using reactive ion etching (RIE) for anisotropic removal or through inductively coupled plasma (ICP) etch for isotropic removal of material. + Implant: Changing ... a photosensitive material spun onto the wafer surface. + Clean / Wet Etch : Cleaning substrates before a sensitive downstream process step or stripping undesirable… more