• Associate Characterization Fab Engineer…

    Northrop Grumman (Linthicum Heights, MD)
    …of metrology (such as CD SEMs. litho overlay tools, surface topology profilers, thin film thickness measurement tools) or analytical tools + Ability to ... of metrology (such as CD SEMs. litho overlay tools, surface topology profilers, thin film thickness measurement tools) or analytical tools + Ability to… more
    Northrop Grumman (12/04/25)
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  • Characterization Fab Engineer Level 1 or 2 (2nd…

    Northrop Grumman (Linthicum Heights, MD)
    …of metrology (such as CD SEMs. litho overlay tools, surface topology profilers, thin film thickness measurement tools) or analytical tools. + Basic knowledge ... of metrology (such as CD SEMs. litho overlay tools, surface topology profilers, thin film thickness measurement tools) or analytical tools. + Basic knowledge… more
    Northrop Grumman (11/07/25)
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  • Plasma Enhanced CVD Semiconductor Process

    Northrop Grumman (Linthicum Heights, MD)
    …* Experience with TEOS- and silane-based dielectric deposition * Experience with thin film characterization equipment and techniques * Experience with ... * Experience with TEOS- and silane-based dielectric deposition * Experience with thin film characterization equipment and techniques * Experience with… more
    Northrop Grumman (12/03/25)
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  • Principal / Senior Principal Electron Beam…

    Northrop Grumman (Linthicum Heights, MD)
    …well as multi-disciplinary. A strong understanding of semiconductor technology, direct process development experience and production background is essential. The ... military platforms. Our multidisciplinary foundry team enables activities spanning from development to sustainment process engineering. ATL is responsible for… more
    Northrop Grumman (11/20/25)
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  • T2/T3 Photolithography Sustaining Engineer - 3rd…

    Northrop Grumman (Linthicum Heights, MD)
    …well as multi-disciplinary. A strong understanding of semiconductor technology, direct process development experience and production background is essential. The ... be experienced with I-Line and DUV exposure systems, maskless direct-write systems, thin film coating, liftoff processes, image reversal, and resist chemistry.… more
    Northrop Grumman (12/13/25)
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